发明名称 DEFECT INSPECTION METHOD, AND DEVICE THEREOF
摘要 PROBLEM TO BE SOLVED: To solve the problem wherein minute foreign matters or defects are disturbances on the detection thereof, since an electric noise is generated, when converting a signal charge generated in the inside by photoelectric transfer into a voltage to be read out, resulting in embedding into the electrical noise a very weak detection signal, obtained by detecting reflection-scattered light from the minute foreign matters or defects, when using a CCD sensor as a photodetector in a foreign matter defect inspecting device. SOLUTION: The electron multiplying type CCD sensor is used as the photodetector, electrons generated by the photoelectric transfer is multiplied to be read out thereafter, a signal by input light gets relatively large thereby, with respect to the electric noise to detect very weak light compared with a conventional CCD, and the micro foreign matters or defects can be detected, as compared to prior art. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006201044(A) 申请公布日期 2006.08.03
申请号 JP20050013472 申请日期 2005.01.21
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 URANO YUTA;NAKANO HIROYUKI;MAEDA SHUNJI;UTO YUKIO
分类号 G01N21/956;H01L21/66;H01L27/148;H04N5/335;H04N5/359;H04N5/372 主分类号 G01N21/956
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