PULSE THERMAL PROCESSING OF FUNCTIONAL MATERIALS USING DIRECTED PLASMA ARC

摘要

A method of thermally processing a material includes the steps of providing an article having a surface film disposed on a substrate, and exposing the thin film to at least one incident pulse of infrared comprising radiation at a power density of at least 0.1 kW/cm² emitted from a directed plasma arc to thermally process the thin film. The at least one pulse has a duration of no more than 10 s. The method provides a radiation intensity and spectrum of radiation capable of heating the surface film to the desired temperature while allowing the substrate to remain at a lower temperature. This feature permits use of substrates that generally are not high temperature tolerant, such as certain polymer substrates.