发明名称 Semiconductor storage device
摘要 An SRAM cell 1 includes inverters 10, 20 , N-type FETs 32, 34, 36, 38 , word lines 42, 44 , bit lines 46, 48 , and voltage applying circuits 50, 60 . The voltage applying circuits 50, 60 apply a voltage V<SUB>dd </SUB>to the word lines 42, 44 at the time of a read operation of the SRAM cell 1 . The voltage applying circuits 50, 60 apply a voltage (V<SUB>dd</SUB>+alpha) to the word lines 42, 44 at the time of a write operation of the SRAM cell 1 . Here, alpha> 0 . Namely, the SRAM cell 1 is configured in such a manner that a voltage applied to word lines 42, 44 at the time of the write operation is higher than at the time of the read operation.
申请公布号 US2006171193(A1) 申请公布日期 2006.08.03
申请号 US20050318777 申请日期 2005.12.28
申请人 NEC ELECTRONICS CORPORATION 发明人 ASAYAMA SHINOBU;KOMURO TOSHIO
分类号 G11C11/00 主分类号 G11C11/00
代理机构 代理人
主权项
地址