发明名称 Planarization of metal container structures
摘要 A conductive material is provided in an opening formed in an insulative material. The process involves first forming a conductive material over at least a portion of the opening and over at least a portion of the insulative material which is outside of the opening. Next, a metal-containing fill material is formed over at least a portion of the conductive material which is inside the opening and which is also over the insulative material outside of the opening. The metal-containing material at least partially fills the opening. At least a portion of both the metal-containing fill material and the conductive material outside of the opening is then removed. Thereafter, at least a portion of the metal-containing fill material which is inside the opening is then removed.
申请公布号 US2006170025(A1) 申请公布日期 2006.08.03
申请号 US20060391316 申请日期 2006.03.29
申请人 发明人 DRYNAN JOHN M.
分类号 H01L29/94;H01L21/8242 主分类号 H01L29/94
代理机构 代理人
主权项
地址