发明名称 FILM DEPOSITION METHOD AND FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition system where aerosol having a fixed grain concentration is efficiently produced, so as to deposit a film having a uniform film thickness. SOLUTION: A plurality of particles are quantitatively fed to a space in a second chamber (12) using a particle feeding means (17), and are made into aerosol, thus the aerosol having a fixed concentration can be efficiently formed. Further, using pressure controlling means (7, 11, 14), by a pressure difference between a first chamber (2) and the second chamber (12), the aerosol is jetted onto a base material (9) fixed inside the first chamber (2) through a carrier tube (3), thus a film having a uniform film thickness is deposited on the base material. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006200013(A) 申请公布日期 2006.08.03
申请号 JP20050014073 申请日期 2005.01.21
申请人 CANON INC 发明人 SAITO YASUYUKI;ISHIKURA ATSUMICHI;SHIBATA HISAARI
分类号 C23C14/24;B05B7/14;B05D1/12;C23C24/04 主分类号 C23C14/24
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