发明名称 |
Ferro electric RAM-memory cell manufacturing method, involves filling trenches with conductive electrode material to form capacitor electrodes so that electrodes in trenches with areas of ferroelectric layers form ferroelectric capacitor |
摘要 |
<p>The method involves applying a ferroelectric layer with a ferroelectric material on another ferroelectric layer. A structured etching mask is applied on the former layer. Trenches are etched by the former layer under application of the mask. The trenches are filled with a conductive electrode material to form capacitor electrodes so that capacitor electrodes in the trenches with the areas of the layers form a ferroelectric capacitor. An independent claim is also included for ferroelectric RAM-memory cells with ferroelectric capacitor for storing more than two states.</p> |
申请公布号 |
DE102005008391(B3) |
申请公布日期 |
2006.08.03 |
申请号 |
DE20051008391 |
申请日期 |
2005.02.24 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
BRUCHHAUS, RAINER;ROEHR, THOMAS |
分类号 |
H01L21/8239;G11C11/22;G11C11/56;H01L27/105 |
主分类号 |
H01L21/8239 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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