发明名称 Ferro electric RAM-memory cell manufacturing method, involves filling trenches with conductive electrode material to form capacitor electrodes so that electrodes in trenches with areas of ferroelectric layers form ferroelectric capacitor
摘要 <p>The method involves applying a ferroelectric layer with a ferroelectric material on another ferroelectric layer. A structured etching mask is applied on the former layer. Trenches are etched by the former layer under application of the mask. The trenches are filled with a conductive electrode material to form capacitor electrodes so that capacitor electrodes in the trenches with the areas of the layers form a ferroelectric capacitor. An independent claim is also included for ferroelectric RAM-memory cells with ferroelectric capacitor for storing more than two states.</p>
申请公布号 DE102005008391(B3) 申请公布日期 2006.08.03
申请号 DE20051008391 申请日期 2005.02.24
申请人 INFINEON TECHNOLOGIES AG 发明人 BRUCHHAUS, RAINER;ROEHR, THOMAS
分类号 H01L21/8239;G11C11/22;G11C11/56;H01L27/105 主分类号 H01L21/8239
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