发明名称 APPARATUS FOR EXAMINING PROJECTION OPTICAL SYSTEM AND METHOD OF MANUFACTURING PROJECTION OPTICAL SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide an examination apparatus capable of accurately examining optical performance of a projection optical system used for oil immersion exposure. <P>SOLUTION: The examination apparatus comprises a reflection spherical surface 8S provided at an image plane side of a projection optical system PL, a liquid feeding mechanism 50 for feeding a liquid LQ between the projection optical system PL and the reflection spherical surface 8S, and a photo-electric detector for photo-electrically detecting measurement light reflected on the reflection spherical surface 8S via the projection optical system PL. The liquid feeding mechanism 50 includes a degassing device which performs degassing so that a solved gas concentration of the liquid LQ fed between the projection optical system PL and the reflection spherical surface 8S becomes less than or equal to 6 ppm. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006203116(A) 申请公布日期 2006.08.03
申请号 JP20050015354 申请日期 2005.01.24
申请人 NIKON CORP 发明人 INOUE RYOSUKE;DAIMON YOSHIYUKI;SASADA KUNIHISA;UEDA TERU;SHIOZAWA HISASHI
分类号 H01L21/027 主分类号 H01L21/027
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