发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device and a semiconductor substrate capable of identifying any bad chip at a stage after dicing even when the surface of a semiconductor wafer is sealed with resin. SOLUTION: The manufacturing method comprises a process of forming a plurality of semiconductor chips 12 on the semiconductor wafer 10, a process of forming electrodes 18 on any semiconductor chip 12, a process of inspecting each of the plurality of the semiconductor chips 12, a process of forming a bad chip mark 14 on any bad chip 12<SB>NG</SB>among the plurality of the semiconductor chips 12, a process of forming a resin layer 20 having different color from the bad chip mark 14 so as to cover the semiconductor wafer 10, and a process of exposing an upper surface of the bad chip mark 14 from the surface of the resin layer 20 by removing a surface layer part of the resin layer 20. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006202953(A) 申请公布日期 2006.08.03
申请号 JP20050012515 申请日期 2005.01.20
申请人 FUJITSU LTD 发明人 ISHIZUKI YOSHIKATSU;IMAIZUMI NOBUHIRO;MIZUKOSHI MASATAKA
分类号 H01L21/66 主分类号 H01L21/66
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