| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam equipment enabling differential evacuation even with an electrostatic lens which requires strict vacuum conditions. SOLUTION: The electron beam equipment 1 is provided with an electronic optical system with an electron gun 2 and an objective lens 7 composed of an electrostatic lens which irradiates primary electrons emitted from the electron gun to a test sample and with a differential exhaust system 12 arranged outside of the objective lens. The distance between an electrode of the objective lens 7 nearest to the test sample W and the test sample is arranged the same as or smaller than that d1 to d3 between the member 12 restricting the exhaust conductance of the differential evacuation system and the test sample W. |
