发明名称 Method for the production of individual monolithically integrated semiconductor circuits
摘要 A method for the production of individual integrated circuit arrangements from a wafer composite is disclosed, whereby the wafer is fixed with the component side (FS) on a support, the individual circuit arrangements ( 21 ) are separated on the support body by the etching of separating trenches ( 27 ) and individually lifted from the support body. The semiconductor substrate ( 20 ) is reduced in thickness during the fixing of the wafer to the support body, preferably to a substrate thickness of less than 100 mum. A reverse face metallization ( 31 ) is deposited on the back face (RS) of the thinned substrate, preferably after separation of the circuit arrangements on the support body.
申请公布号 US7084047(B2) 申请公布日期 2006.08.01
申请号 US20050524251 申请日期 2005.02.09
申请人 UNITED MONOLITHIC SEMICONDUCTORS GMBH 发明人 BEHAMMER DAG
分类号 H01L21/46;H01L21/301;H01L21/68;H01L21/78 主分类号 H01L21/46
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