发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device has an active element structure formed on a semiconductor substrate. A first insulating film is provided above the semiconductor substrate. A first interconnect layer composed of copper is provided in a surface of the first insulating film. A second insulating film is provided on the first insulating film. A connection hole is formed in the second insulating film and has its bottom connected to the first insulating layer. A connection plug composed of a single crystal of copper is filled in the connection hole so that no other crystals of copper are provided in the connection hole. An interconnect trench is formed in a surface of the second insulating film and has its bottom connected to the connection hole. A second interconnect layer is provided in the interconnect trench.
申请公布号 US7084510(B2) 申请公布日期 2006.08.01
申请号 US20040765833 申请日期 2004.01.29
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HIGASHI KAZUYUKI;MATSUNAGA NORIAKI
分类号 H01L29/40;H01L21/3205;H01L21/44;H01L21/768;H01L23/52;H01L23/532 主分类号 H01L29/40
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