| 摘要 |
A method and a device for forming at least a first pattern on a substrate ( 6,28 ), which is coated with a layer ( 5 ) on at least a first planar surface, are described. According to the method, a first pressing means ( 27 ) is arranged with a first structure ( 32 ) that defines the pattern, and the substrate ( 28 ) is arranged so that the first pressing means ( 27 ) is separated from the substrate ( 28 ) and so that the first pressing means ( 27 ) and the substrate ( 28 ) are unable to move transversely of the common center line ( 50 ) but are able to move freely in a direction along the center line ( 50 ). Subsequently, the first pressing means ( 27 ) is contacted with the substrate ( 28 ) while maintaining the common center line, and a pressure is applied to the substrate ( 28 ) and the first pressing means ( 27 ) to form said at least one pattern in the layer ( 30 )
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