| 摘要 |
An industrial process diagnostic apparatus is provided which can identify a source, or "root cause", of an aberration in an industrial process. A plurality of process configuration models are provided which each represent a physical (or actual) implementation of an industrial process. One of the plurality of models is selected and diagnostics performed on the process using the selected model and at least one process signal related to the process. Based upon the diagnostics, a root cause of the aberration is determined.
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