发明名称 RF current return path for a large area substrate plasma reactor
摘要 An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.
申请公布号 US7083702(B2) 申请公布日期 2006.08.01
申请号 US20030460916 申请日期 2003.06.12
申请人 APPLIED MATERIALS, INC. 发明人 BLONIGAN WENDELL;KELLER ERNST;SORENSEN CARL
分类号 H01L21/00;H01J37/32;H01L21/68 主分类号 H01L21/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利