发明名称 |
Method of optimizing focus of optical inspection apparatus and method and apparatus of detecting defects using the same |
摘要 |
According to a method of optimizing a focus of an optical inspection apparatus, a first light is irradiated onto a substrate. Then, the first light is reflected on the substrate to form a second light. The second light is sensed with various foci to form image information corresponding to each of the foci. Then, a relation between foci of the optical inspection apparatus and gain value corresponding to the image information is obtained. Then, the focus corresponding to a minimum gain value is set up as an optimized focus. Thus, a focus of an optical inspection apparatus is accurately adjusted to enhance efficiency of defecting defects, so that defects of semiconductor apparatus are more accurately detected.
|
申请公布号 |
US7084969(B2) |
申请公布日期 |
2006.08.01 |
申请号 |
US20040801525 |
申请日期 |
2004.03.12 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM DEOK-YONG;KIM SEONG-JIN |
分类号 |
G01N21/00;G01N21/88;G01N21/95;G02B7/32 |
主分类号 |
G01N21/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|