发明名称 |
Ion beam extractor with counterbore |
摘要 |
An extractor system for a plasma ion source has a single (first) electrode with one or more apertures, or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction electrode, with one or more aligned apertures. The aperture(s) in the first electrode (or the second electrode or both) have a counterbore on the downstream side (i.e. away from the plasma ion source or facing the second electrode). The counterbored extraction system reduces aberrations and improves focusing. The invention also includes an ion source with the counterbored extraction system, and a method of improving focusing in an extraction system by providing a counterbore.
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申请公布号 |
US7084407(B2) |
申请公布日期 |
2006.08.01 |
申请号 |
US20030367664 |
申请日期 |
2003.02.13 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
JI QING;STANDIFORD KEITH;KING TSU-JAE;LEUNG KA-NGO |
分类号 |
H01J27/00;H01J7/24;H01J27/02 |
主分类号 |
H01J27/00 |
代理机构 |
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代理人 |
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地址 |
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