COMPOSITION FOR CLEANING A SEMICONDUCTOR SUBSTRATE, METHOD FOR CLEANING A SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号
KR100606187(B1)
申请公布日期
2006.08.01
申请号
KR20040054828
申请日期
2004.07.14
申请人
TECHNO SEMICHEM CO LTD;SAMSUNG ELECTRONICS CO LTD
发明人
LEE KYUNG JIN;AHN SEUNG HYUN;CHOI BAIK SOON;BAEK KUI JONG;HAHN WOONG
