| 摘要 |
In a low-deformation support device of an optical element ( 8, 24 ), in particular an end plate ( 14 ) of a projection objective ( 7 ) of a projection exposure machine ( 3 ) for microlithography for the purpose of producing semiconductor components, in a mount ( 13 ), the optical element ( 8, 14 ) is connected to the mount ( 13 ) at least partly via a bonded connection. The bonded connection is located between the adjacent circumferential wails of mount ( 13 ) and optical element ( 14 ). The mount ( 13 ) is provided with at least three bearing elements ( 20 ) which are distributed over the circumference and by means of which the optical element ( 8, 14 ) is laterally and axially supported. The mount ( 13 ) has spring elements ( 15 ) which are constructed monolithically with the bearing elements ( 20 ) and are soft in axial and radial directions.
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