发明名称 LOW PRESSURE VAPOR PHASE DEPOSITION OF ORGANIC THIN FILMS
摘要 <p>Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.</p>
申请公布号 KR100606325(B1) 申请公布日期 2006.07.31
申请号 KR20067004695 申请日期 2006.03.07
申请人 发明人
分类号 H05B33/10;C23C16/00;C23C16/30;H01L51/00;H01L51/30;H01L51/40;H01L51/50 主分类号 H05B33/10
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