发明名称 Fermgangsmåde til fremstilling af en organisk film
摘要 A compound represented by a general formula (1) ABXn (where A is a carbon-containing group; B is at least one element selected from Si, Ge, Sn, Ti and Zr; X is a hydrolyzable group; and n is 1, 2 or 3), for example, a chlorosilane compound having a fluorocarbon group, is measured in an amount required for one time application, and dropped from a nozzle 21 on a surface of a substrate 20 having an active hydrogen on the surface, and simultaneously it is rubbed with a coater 22 made of a sponge or a nonwoven fabric, etc. Furthermore, it is rubbed with a coater 24 made of a sponge or a nonwoven fabric, etc. while blowing a dry warm air 23, and an elimination reaction is caused between the active hydrogen on the surface of the substrate and the hydrolyzable group of the compound. Thus, the compound is covalently bonded to the substrate. The molecules of the silane compound also are polymerized with one another to be fixed. Thus can be provided a coating film and a method and an apparatus for producing the same, in which: an amount of a liquid required for forming a film is decreased even when the substrate has an irregular shape and a large size; it is not necessary to be concerned for the pot life of a coating solution; the substrate is manipulated easily; and cost is low. <IMAGE>
申请公布号 DK1445034(T3) 申请公布日期 2006.07.31
申请号 DK20040010197T 申请日期 2000.08.16
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 EBISAWA, MITSUO;OGAWA, KAZUFUMI;MINO, NORIHISA;OONO, YOSHIAKI
分类号 B05D1/18;B05C1/02;B05C1/06;B05C5/00;B05C9/14;B05D1/40;B05D3/04;B05D3/10;B05D5/08;B05D7/24;C03C17/28;C03C17/30;C04B41/49;C04B41/84;C09D183/04;C09D185/00 主分类号 B05D1/18
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