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发明名称
PROCESS FOR PREPARING NICKEL OXIDE THIN FILM BY ATOMIC LAYER DEPOSITION USING NICKEL(II) AMINOALKOXIDE
摘要
申请公布号
KR20060085840(A)
申请公布日期
2006.07.28
申请号
KR20050006774
申请日期
2005.01.25
申请人
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
发明人
KIM, YUN SOO;KIM, CHANG GYOUN;LEE, YOUNG KUK;CHUNG, TAEK MO;AN, KI SEOK;CHO, WON TAE;YANG, TAEK SEUNG;KIM, MIN CHAN
分类号
C01G53/04
主分类号
C01G53/04
代理机构
代理人
主权项
地址
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