| 摘要 |
PROBLEM TO BE SOLVED: To provide a new compound suitable for an aromatic polyamide resin having negative type photosensitivity. SOLUTION: The isophthalic acid derivative is represented by chemical formula 1 (wherein, R<SB>1</SB>is a hydrogen atom or a methyl group). COPYRIGHT: (C)2006,JPO&NCIPI
|
