| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which no powder dust is produced in the vicinity of a substrate processing region. SOLUTION: A water cleaning treatment unit 4 which makes a brush body portion 43 contact against a main surface of a substrate W, and at the same time, reciprocate to treat the substrate W is equipped with a rod-like support 44 with the brush body portion 43 attached to, and arranged such that the longitudinal direction is substantially parallel to the reciprocal movement direction, a receiving part 45 having an opening in which the support 44 is held, and a driving source 51 carrying out a reciprocation drive of the support 44 along the reciprocal movement direction. At least a part of the surface of the support 44 is formed with a magnetic body having a predetermined magnetic pole, and at the same time, a magnetic body composed of a magnetic pole repulsive to the magnetic pole of the support 44 surface is provided on at least a part of an opening inner surface of the receiving part 45 opposed to the magnetic body of the support 44. COPYRIGHT: (C)2006,JPO&NCIPI
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