发明名称 |
Pattern-forming method, color filter manufacturing method, color filter, electro-optical apparatus manufacturing method, and electro-optical apparatus |
摘要 |
A pattern-forming method includes forming a partitioning layer on a foundation layer; forming a partitioning from the partitioning layer by patterning; and ejecting droplets containing a pattern-forming material onto a pattern-forming area that is enclosed by the foundation layer and the partitioning to form a pattern on the foundation layer. The forming of the partitioning layer includes forming a preliminary partitioning on the foundation layer, the preliminary partitioning including the partitioning and a residue fragment of the partitioning layer that is in the pattern-forming area, and performing patterning on the foundation layer using the residue fragment as a mask, thereby forming an uneven surface on the foundation layer.
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申请公布号 |
US2006164742(A1) |
申请公布日期 |
2006.07.27 |
申请号 |
US20060331049 |
申请日期 |
2006.01.13 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KATAGAMI SATORU;FUKUDA ATSUSHI |
分类号 |
G02B5/00 |
主分类号 |
G02B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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