发明名称 Pattern-forming method, color filter manufacturing method, color filter, electro-optical apparatus manufacturing method, and electro-optical apparatus
摘要 A pattern-forming method includes forming a partitioning layer on a foundation layer; forming a partitioning from the partitioning layer by patterning; and ejecting droplets containing a pattern-forming material onto a pattern-forming area that is enclosed by the foundation layer and the partitioning to form a pattern on the foundation layer. The forming of the partitioning layer includes forming a preliminary partitioning on the foundation layer, the preliminary partitioning including the partitioning and a residue fragment of the partitioning layer that is in the pattern-forming area, and performing patterning on the foundation layer using the residue fragment as a mask, thereby forming an uneven surface on the foundation layer.
申请公布号 US2006164742(A1) 申请公布日期 2006.07.27
申请号 US20060331049 申请日期 2006.01.13
申请人 SEIKO EPSON CORPORATION 发明人 KATAGAMI SATORU;FUKUDA ATSUSHI
分类号 G02B5/00 主分类号 G02B5/00
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