| 发明名称 |
Sputtering cathode, production method and corresponding cathode |
| 摘要 |
Sputtering cathode and method has a basic cathode body with cooling arrangement, and a cooling contact body disposed between the cooling arrangement and a target such that it is heat conducting, and wherein the contact face between the cooling contact body and the target is provided with a friction-reducing layer.
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| 申请公布号 |
US2006163059(A1) |
申请公布日期 |
2006.07.27 |
| 申请号 |
US20050525993 |
申请日期 |
2005.02.28 |
| 申请人 |
LEITNER KLAUS;HIERMER ANDREAS M R |
发明人 |
LEITNER KLAUS;HIERMER ANDREAS M.R. |
| 分类号 |
C23C14/00;H05H1/24;C23C14/34;H01J37/34 |
主分类号 |
C23C14/00 |
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