| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a nonreflection structure having excellent antireflection effect with high accuracy by using X-ray lithography, in particular, a method forming the nonreflection structure with high accuracy even on a curved surface such as a lens surface. <P>SOLUTION: The manufacturing method of optical element having nonreflection structure is provided with: a first exposure process that exposes X-ray to a substrate to be an optical element via an X-ray mask; a second exposure process of at least one time that moves at least one side of the X-ray mask and the substrate, changes a relative positional relation of both of them and, thereafter, further exposes X-ray to the substrate exposed via the X-ray mask; and a development process that develops the exposed substrate. When one of X-ray transmission regions is made to be a basic pattern and an arrangement of a virtual X-ray transmission region corresponding to the nonreflection structure to be formed on the substrate is made to be a whole pattern, the X-ray mask has a mask pattern arranged so that basic patterns are not adjacent to one another and the pattern corresponding to the whole pattern is exposed on the substrate according to X-ray exposures of a plurality of times including the first exposure process and the second exposure process. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
