发明名称 |
Projection exposure apparatus, projection exposure method, and method for producing device |
摘要 |
A projection exposure apparatus transfers a pattern formed on a mask onto a substrate via a projection optical system. The projection exposure apparatus includes electricity removal units which removes electricity from a liquid supplied to a space between the projection optical system and the surface of a substrate. This makes it possible to prevent destruction of the circuit pattern or malfunction of the device which would otherwise caused by charging of the liquid.
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申请公布号 |
US2006164617(A1) |
申请公布日期 |
2006.07.27 |
申请号 |
US20060390370 |
申请日期 |
2006.03.28 |
申请人 |
NIKON CORPORATION |
发明人 |
NAGAHASHI YOSHITOMO |
分类号 |
G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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