FILM-FORMING APPARATUS, FILM-FORMING METHOD, MANUFACTURING METHOD, AND TITANIUM FILM

摘要

Disclosed is a film-forming apparatus for forming a titanium film on a substrate which comprises a chamber for holding a substrate inside, a material holding unit for holding a metal material as the raw material for the titanium film, a film-forming unit for forming a titanium film on the substrate by using the metal material, an introducing unit for introducing a gas into the chamber, and a partial pressure-controlling unit for controlling the partial pressure of the gas inside the chamber so as to enable the film-forming unit to form a titanium film having a desired film density.