发明名称 MANUFACTURING METHOD OF MASK SUBSTRATE AND MICRO LENS
摘要 <P>PROBLEM TO BE SOLVED: To provide a mask substrate with which a lens of a desired shape can be obtained. <P>SOLUTION: Four gray scale masks 6, 7, 8, 9 are formed on the mask substrate 5. These gray scale masks are formed by exposure transferring the patterns formed on the same mask substrate by changing an exposure time onto resist. Accordingly, the arrangement of the dot patterns is the same among the respective gray scale masks 6, 7, 8, 9, but the sizes of the dot patterns vary greatly according to the difference in the exposure time. The microlenses as samples are manufactured by using each of the respective gray scale masks 6, 7, 8, 9 and the gray scale mask used for manufacturing the microlens of the shape of the finished microlens having the shape most approximate to the target value is used in manufacturing the subsequent microlenses. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006195252(A) 申请公布日期 2006.07.27
申请号 JP20050007795 申请日期 2005.01.14
申请人 NIKON CORP 发明人 TAKIZAWA KAZUYUKI
分类号 G02B3/00;G03F1/00;G03F1/70;G03F7/20 主分类号 G02B3/00
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