发明名称 STAGE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To achieve a stage apparatus with the small Abbe error in stage apparatuses performing position control on the basis of the result of measurement of laser ranging devices. <P>SOLUTION: A workpiece holding stage 22 is arranged on a moving stage 10, on which a workpiece 30 is mounted. By housing a laser ranging device 42 in the moving stage 10 and also by attaching a laser beam reflective unit 44 to flank of the moving stage 10, an optical axis of the laser beam emitted from/received at a laser port opening 43 can be shifted up to a position on the surface of the workpiece holding stage 22. Because a mirror 41 is placed on a position facing to the workpiece holding stage 22, the laser beam is reflected at a total reflection mirror 45a and a total reflection mirror 45b to enter the mirror 41 placed at a position facing to the total reflection mirror 45b. The laser beam reflected at the mirror 41 is reflected again at the total reflection mirror 45b and at the total reflection mirror 45a to enter the laser ranging device 42. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006194672(A) 申请公布日期 2006.07.27
申请号 JP20050005122 申请日期 2005.01.12
申请人 USHIO INC 发明人 SANO NAOTO
分类号 G01B11/00;G03F7/20;H01L21/027;H01L21/68 主分类号 G01B11/00
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