FILM DEPOSITION SYSTEM, APPARATUS FOR PRODUCING DISPLAY DEVICE AND METHOD FOR PRODUCING DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus for producing a display device capable of stably producing a display element formed of a thin film with a desired film thickness. SOLUTION: The film deposition system comprises: a vapor deposition source 410 provided with a material source for depositing a thin film composing a display element; a measuring mechanism 420 confronted with the vapor deposition source 410 in a waiting position 501 and measuring a vapor deposition rate; a scanning mechanism 430 for scanning the main face of the substrate SUB to be treated in a state of being confronted with the vapor deposition source 410 in a treatment position 502 different from the waiting position; and a velocity setting mechanism 440 for setting the scanning velocity of the scanning mechanism 430 based on the vapor deposition rate measured by the measuring mechanism 420 in such a manner that the change in the film deposition thickness on the main face of the substrate to be treated in accordance with the passage of time from the start of the scattering of the material source from the vapor deposition source 410 is compensated. COPYRIGHT: (C)2006,JPO&NCIPI