发明名称 MANUFACTURING METHOD OF MEMBER HAVING ANTIREFLECTION STRUCTURAL BODY
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection structural body with high accuracy by using X-ray lithography, in particular, a method forming the antireflection structural body with high accuracy even on a curved surface such as a lens surface. <P>SOLUTION: In the manufacturing method of member having antireflection structural body, the antireflection structural body has a structural unit of a prescribed shape and is formed by arranging the prescribed shapes in an array form below a pitch of a wavelength of light of which reflectance is reduced. The manufacturing method is provided with: a first exposure process of exposing X-ray to a substrate as a member on which the antireflection structural body is formed via an X-ray mask having a line and space pattern; a second exposure process of including at least one time of a rotative exposure process of exposing X-ray to a substrate after rotating at least one of the X-ray mask and the substrate around an optical axis of the X-ray; and a development process of developing the exposed substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006195291(A) 申请公布日期 2006.07.27
申请号 JP20050008298 申请日期 2005.01.14
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAMURA TAKAMASA;UMETANI MAKOTO
分类号 G02B1/11;G03F1/22;G03F7/20 主分类号 G02B1/11
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