| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of irradiating light, having a luminance optimal for the sensitivity and the thickness of a photosensitive material for a photosensitive layer formed on a semiconductor substrate. <P>SOLUTION: A luminance detecting unit 19 operates the luminance of ultraviolet light irradiated against the photosensitive layer or the photosensitive material, based on the measured value of luminance measured by a luminance meter 18. Impressed voltage or impressed current on a light source 11 is controlled, based on a luminance difference between the operated luminance and an inputted luminance inputted from an inputting unit 21 to regulate the luminance of the ultraviolet light irradiated on the photosensitive material so as to be the inputted luminance. Next, the luminance detecting unit 19 opens a shutter 15, to begin the irradiation of ultraviolet light on the photosensitive material. The luminance of ultraviolet light irradiated on the photosensitive material and the time of elapse from a time point whereat the shutter 15 is opened are accumulated, to obtain the accumulated light exposure. When the accumulated light exposure has arrived at the inputted light exposure, the shutter 15 is closed, whereby the irradiation of ultraviolet light against the photosensitive material is stopped. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
