| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing composition having excellent polishing power and capable of eliminating the grinding flaw, etc., on a coating film in a short time. <P>SOLUTION: The polishing composition at least contains water, grinding particles, a petroleum-based solvent, a surfactant and a thickener and further contains 0.1-20 wt.% plasticizer. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
