| 摘要 |
An integration system for obtaining a set of overlay offset parameters of a first process layer which is going to be formed in an assigned photolithography tool with an assigned mask and an assigned pre-tool. By using the integration system, the set of overlay offset parameters of the first process layer can be precisely predicted based on summing the historic-recoded set of overlay offset parameters and the bias values including a mask bias value, a photolithography tool bias value and a pre-tool bias value. Therefore, the overlay offset parameters corresponding to the same process layer can be well integrated and managed. Hence, the cost and time due to performing the test run can be saved and the throughput can be increased as well.
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