METHOD FOR METALLIZING INSULATING SUBSTRATES WHEREIN THE ROUGHENING AND ETCHING PROCESSES ARE CONTROLLED BY MEANS OF GLOSS MEASUREMENT
摘要
The invention relates to a control of etching processes of insulating substrates by means of gloss measurement. By this method a surface roughness can be achieved which leads to good adhesion of metals layers deposited in subsequent metallization steps. This method is particularly suited for the production of printed circuit boards.
申请公布号
WO2006050792(A8)
申请公布日期
2006.07.27
申请号
WO2005EP11231
申请日期
2005.10.19
申请人
ATOTECH DEUTSCHLAND GMBH;PIEL, MERTEN;STAMP, LUTZ;MOEPERT, CHRISTIANE