发明名称 METHOD AND APPARATUS OF MEASURING ABERRATION AND OF EXPOSURE
摘要 <P>PROBLEM TO BE SOLVED: To measure the aberration of a projection optical system with high precision for a short time. <P>SOLUTION: An image 1AB by a projection optical system PL of a line pattern is scanned by a slit 9A, and the image surface amplitude function F1(X) of the image is found. The Fourier transformation is performed in the image surface function obtained from a predetermined image surface phase function G1(&theta;) and predetermined image surface amplitude function F1(X), and a pupil plane function (amplitude function f1(X) and a phase function g1(&theta;)) are found. The phase function g1(&theta;) is obtained when an image surface amplitude function obtained by performing inverse Fourier transform of the pupil plane function obtained from the function which gives the defocus effect to the phase function and the amplitude function f1(X), and the image surface phase function F2(X) measured by actually defocusing, are approximately matched. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006196555(A) 申请公布日期 2006.07.27
申请号 JP20050004590 申请日期 2005.01.11
申请人 NIKON CORP 发明人 HAGIWARA TSUNEYUKI
分类号 H01L21/027;G01M11/02 主分类号 H01L21/027
代理机构 代理人
主权项
地址