| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming spacers by which spacers of 12μmΦlevel are formed uniformly on the entire surface of a color filter substrate by using a proximity exposure technique. SOLUTION: In the proximity exposure technique, a first exposure to expose respective spacer forming regions via first mask openings with a predetermined aperture width arranged on an exposure mask, and a second exposure to expose regions inside the regions subjected to the first exposure via second mask openings with an aperture width less than the predetermined aperture width arranged on the exposure mask or on another exposure mask, are successively conducted. The first exposure determines a width (a base portion width) of the spacers to be formed, and the second exposure has no influence on the width of the spacers to be formed. The height (thickness) of the spacer to be formed is determined with the exposure by setting the exposure to the region where the first exposure and the second exposure overlap with each other to be the exposure sufficient for hardening the negative type photosensitive material layer. COPYRIGHT: (C)2006,JPO&NCIPI
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