| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for depositing a hard carbon thin film having high density in a large area and in a three-dimensional shape. SOLUTION: Using a method of depositing a hard carbon film where the surface of a substrate is irradiated with ion beams of a gas cluster comprising ultrafine particles with a particle diameter of≤500 nm, thus ultrafine particles or a compound of the ultrafine particles and a gas is formed, wherein, the ultrafine particles are composed of spherical carbons expressed by graphite, carbon nanotubes or Cn (n is the integer selected from 60, 70, 76, 84 or the like), and the gas is composed of argon. In the gas cluster ion beam device, a means of feeding ultrafine particles with the particle diameter of≤500 nm is provided between a gas cyclinder and a gas cluster generation part. COPYRIGHT: (C)2006,JPO&NCIPI
|
