| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus, having a liquid feed system configured to supply immersion liquid to spacing between the final element and substrate of the projection system, for which the improvement is made so that the liquid from the near-by area of the substrate can be removed efficiently. <P>SOLUTION: This liquid feed system comprises a seal component for forming a sealing between the lower surface of the system and the substrate that virtually accommodates the liquid in the spacing. A concave section is formed on the lower surface, and the concave section is connected with a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source is set to be at a lower pressure level than that of the second pressure source so that the gas flow is produced, from the second pressure source to the first pressure source. The liquid and/or gas can be extracted due to this flow. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
