| 发明名称 |
Positive photoresist composition and method of forming resist pattern |
| 摘要 |
A positive photoresist composition comprising an alkali-soluble novolak resin (A) containing a structural unit (a1) represented by a general formula (I) shown below, and a structural unit (a2) represented by a general formula (II) shown below, and a photosensitizer (B).
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| 申请公布号 |
US2006166131(A1) |
申请公布日期 |
2006.07.27 |
| 申请号 |
US20040564453 |
申请日期 |
2004.07.15 |
| 申请人 |
TOKYO OHKA KOGYO, CO., LTD. |
发明人 |
MASUDA YASUO;OKUI TOSHIKI |
| 分类号 |
G03C1/76;C08G8/10;C08L61/06;G03F7/023;H01L21/027 |
主分类号 |
G03C1/76 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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