PATTERN FORMING METHOD, MANUFACTURING METHOD OF COLOR FILTER, COLOR FILTER, MANUFACTURING METHOD OF ELECTROOPTICAL APPARATUS AND ELECTROOPTICAL APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method by which volume of a liquid drop ejected in a pattern forming region is determined based on wettability of the liquid drop toward the pattern forming region to improve uniformity of a pattern shape and productivity thereby and to provide a manufacturing method of a color filter, the color filter, a manufacturing method of an electrooptical apparatus and the electrooptical apparatus.

SOLUTION: Thickness of the liquid drop 20 from an impact surface 11a (minimum permissible liquid drop thickness H mn) when an outer periphery of the liquid drop 20 is coincident with an outer edge of the impact surface 11a, is deduced from a shape of an organic electroluminescence layer forming region S (wet width Wa) and an impact surface contact angle θa. Lower limit volume to be ejected in the organic electroluminescence layer forming region S is determined based on the minimum permissible liquid drop thickness H mn and the volume of the liquid drop 20 to be ejected in the organic electroluminescence layer forming region S is set to be the lower limit volume or more.

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