发明名称 PATTERN FORMATION DEVICE, PATTERN FORMATION METHOD, PRODUCTION METHOD FOR COLOR FILTER, COLOR FILTER, PRODUCTION METHOD FOR ELECTRO-OPTICAL DEVICE AND ELECTRO-OPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a pattern formation method enhancing uniformness of a pattern shape by making a drying environment of a liquid drop relative to a substrate surface uniform and enhancing its productivity, a pattern formation device, a production method for a color filter, a color filter, a production method for an electro-optical device and an electro-optical device. <P>SOLUTION: A first pressure-reduction chamber 31 communicatable with a storage chamber 22 for storing a transparent substrate 2 is provided just above an element formation surface 2s, a first communication passage (suction hole 33 and discharge hole 29) for communicating the storage chamber 22 and the first pressure-reduction chamber 31 is formed at a size opposed to the element formation surface 2s and further, a volume of a first pressure-reduction chamber 32 in the first pressure-reduction chamber 31 is formed at a larger volume than that of the storage chamber 22. Further, a pressure in the first pressure-reduction chamber 32 is adjusted to a first target pressure for previously pressure-reduction-drying the liquid drop. When the liquid drop 18 is dried, a first valve 29V is opened to communicate the storage chamber 22 and the first pressure-reduction chamber 32. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006192319(A) 申请公布日期 2006.07.27
申请号 JP20050003425 申请日期 2005.01.11
申请人 SEIKO EPSON CORP 发明人 ITO KATSUICHI
分类号 B05D3/12;B05C5/00;B05D1/26;G02B5/20;G02F1/1335;G09F9/00;H01L51/50;H05B33/10 主分类号 B05D3/12
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