Method of forming metal layer pattern and method of manufacturing image sensor using the same

摘要

A method of forming a metal layer pattern comprises forming an interlayer insulating layer on a semiconductor substrate, forming a metal layer on the interlayer insulating layer, forming a mask pattern to expose a predetermined area of the metal layer, and forming a metal layer pattern by dry etching the exposed predetermined area of the metal layer with a substrate bias power of about 5 W to about 40 W.