RESIST REMOVING METHOD AND RESIST REMOVING EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a resist removing method and resist removing equipment capable of efficiently and uniformly removing resist on the surface of a substrate. SOLUTION: The resist removing method comprises an ozone water treatment process of treating treatment surface of the substrate with ozone water and a mixed solvent treatment process of removing residue on the treatment surface by using mixed solvent of at least one kind organic solvent 100 pts.wt. selected from a group consisting ofγ-butyrolactone, ethyleneglycol diacetate and diacetin (glycerol diacetate) and water 5 to 100 pts.wt. COPYRIGHT: (C)2006,JPO&NCIPI