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发明名称
Method for forming a self aligned contact using a photoresist pattern
摘要
申请公布号
KR100604801(B1)
申请公布日期
2006.07.26
申请号
KR20000009869
申请日期
2000.02.28
申请人
发明人
分类号
H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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