发明名称 Semiconductor photodetection device and fabrication process thereof
摘要 A semiconductor photodetection device includes a photodetection layer formed of an alternate and repetitive stacking of an optical absorption layer accumulating therein a compressive strain and a stress-compensating layer accumulating therein a compensating tensile strain, wherein the optical absorption layer has a thickness larger than a thickness of the stress-compensating layer.
申请公布号 US7081639(B2) 申请公布日期 2006.07.25
申请号 US20010873264 申请日期 2001.06.05
申请人 FUJITSU QUANTUM DEVICES LIMITED 发明人 UCHIDA TORU;ANAYAMA CHIKASHI
分类号 C23C16/30;H01L31/0304;H01L21/205;H01L31/0352;H01L31/10;H01L31/105 主分类号 C23C16/30
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