发明名称 Process for fabrication of a liquid crystal display with thin film transistor array free from short-circuit
摘要 Pixels of a liquid crystal display are laid on a delta pattern, and short-circuit is liable to take place between a source layer and a drain layer and/or between a gate layer and a storage electrode layer, wherein a contact slit is formed in a gate insulating layer intervening between the gate/storage electrode layers and the source/drain layers in such a manner as to break a piece of residual amorphous silicon and make a piece of residual metal exposed thereto, and the piece of residual metal is broken during a patterning step for the source/drain layers.
申请公布号 US7081930(B2) 申请公布日期 2006.07.25
申请号 US20040782908 申请日期 2004.02.23
申请人 NEC LCD TECHNOLOGIES, LTD. 发明人 TAGUCHI NAOYUKI
分类号 G02F1/136;H01L29/786;G02F1/1343;G02F1/1362;G02F1/1368;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L27/13 主分类号 G02F1/136
代理机构 代理人
主权项
地址