POLYMER FOR CHEMICALLY AMPLIFIED PHOTORESIST AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME,申请号KR20050004453-传众专利搜索

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发明名称	POLYMER FOR CHEMICALLY AMPLIFIED PHOTORESIST AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME
摘要
申请公布号	KR20060083581(A)	申请公布日期	2006.07.21
申请号	KR20050004453	申请日期	2005.01.18
申请人	DONGJIN SEMICHEM CO., LTD.	发明人	OH, SEUNG KEUN;PARK, CHAN SIK;LEE, JAE WOO;KIM, JAE HYUN
分类号	G03F7/039	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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