| 发明名称 |
POLARIZED RADIATION FOR LITHOGRAPHIC DEVICE AND METHOD OF MANUFACTURING DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide polarized radiation for a lithographic device and method of manufacturing the device. <P>SOLUTION: The lithographic device employs polarized light to improve an imaging property such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic device. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2006191064(A) |
申请公布日期 |
2006.07.20 |
| 申请号 |
JP20050375578 |
申请日期 |
2005.12.27 |
| 申请人 |
ASML NETHERLANDS BV;CARL ZEISS SMT AG |
发明人 |
WAGNER CHRISTIANE;DE BOEIJ WILHELMUS PETRUS;HEIL TILMANN;FIOLKA DAMIAN;DE JONGE ROEL |
| 分类号 |
H01L21/027;G02B5/30;G03F7/20 |
主分类号 |
H01L21/027 |
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